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Dry-Deposited Resist Shows Different Tone Behavior Under EUV And E-Beam Exposure (KU Leuven, Kunsan, VUB, Imec)

Research demonstrates differing EUV and e-beam tone conversion in dry-deposited resists

By GPU Data Hub Desk · GPU Data Hub·Editorial standards··Belgium

A research consortium including Imec and KU Leuven has analysed the radiation response of dry-deposited metal-organic resists under extreme ultraviolet and electron-beam lithography. The study reveals distinct tone conversion behaviour depending on the exposure source employed during the patterning cycle. These findings offer useful insights for developing new resist chemistries required for advanced semiconductor manufacturing.

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This summary was written by the GPU Data Hub desk from reporting published by Semiconductor Engineering on 25 Oct 2026, 21:08. Read the full article at the original publisher.

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