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Pt-W Alloy Shows Potential For Thinner High-NA EUV Mask Absorbers (Chinese Academy of Sciences et al.)

Platinum-tungsten alloy evaluated for thinner high-NA EUV mask absorbers

By GPU Data Hub Desk · GPU Data Hub·Editorial standards··China

Researchers at the Chinese Academy of Sciences and affiliated institutions have published technical work evaluating a platinum-tungsten alloy for high-NA extreme ultraviolet mask absorbers. The research suggests the alloy could allow for thinner absorber layers, supporting improved imaging performance during lithography. Advancements in absorber materials remain vital for scaling optical performance in future semiconductor fabrication nodes.

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This summary was written by the GPU Data Hub desk from reporting published by Semiconductor Engineering on 25 Oct 2026, 21:17. Read the full article at the original publisher.

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